Three-state resistive switching in HfO<inf>2</inf>-based RRAM

Xiaojuan Lian, Enrique Miranda, Shibing Long, Luca Perniola, Ming Liu, Jordi Suñé

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12 Citas (Scopus)

Resumen

We investigate the reset transition of HfO2-based RRAM structures with emphasis on revealing three-state resistive switching effects. We study nonpolar switching in Pt/HfO2/Pt and unipolar/bipolar switching in Pt/Ti/HfO2/Pt structures, respectively. However, three-state resistive switching is only confirmed in the former case by means of various reset methodologies. Using two-step reset experiments it is shown that the transition to the complete reset state occurs at higher voltages if the CF first drops to the intermediate state. © 2014 Elsevier Ltd. All rights reserv.
Idioma originalInglés
Páginas (desde-hasta)38-44
PublicaciónSolid-State Electronics
Volumen98
DOI
EstadoPublicada - 1 ene 2014

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