TY - JOUR
T1 - The Role of the Fermi Level Pinning in Gate Tunable Graphene-Semiconductor Junctions
AU - Chaves, Ferney A.
AU - Jiménez, David
PY - 2016/11/1
Y1 - 2016/11/1
N2 - © 2016 IEEE. Graphene-based transistors relying on a conventional structure cannot switch properly because of the absence of an energy gap in graphene. To overcome this limitation, a barristor device was proposed, whose operation is based on the modulation of the graphene-semiconductor (GS) Schottky barrier by means of a top gate, and demonstrating an ON-OFF current ratio up to 105. Such a large number is likely due to the realization of an ultraclean interface with virtually no interface trapped charge. However, it is indeed technologically relevant to know the impact that the interface trapped charges might have on the barristor's electrical properties. We have developed a physics-based model of the gate tunable GS heterostructure where nonidealities, such as Fermi level pinning and a 'bias-dependent barrier lowering effect' have been considered. Using the model, we have made a comprehensive study of the barristor's expected digital performance.
AB - © 2016 IEEE. Graphene-based transistors relying on a conventional structure cannot switch properly because of the absence of an energy gap in graphene. To overcome this limitation, a barristor device was proposed, whose operation is based on the modulation of the graphene-semiconductor (GS) Schottky barrier by means of a top gate, and demonstrating an ON-OFF current ratio up to 105. Such a large number is likely due to the realization of an ultraclean interface with virtually no interface trapped charge. However, it is indeed technologically relevant to know the impact that the interface trapped charges might have on the barristor's electrical properties. We have developed a physics-based model of the gate tunable GS heterostructure where nonidealities, such as Fermi level pinning and a 'bias-dependent barrier lowering effect' have been considered. Using the model, we have made a comprehensive study of the barristor's expected digital performance.
KW - Barristor
KW - Fermi level pinning (FLP)
KW - graphene based devices
KW - semiconductor device modeling
KW - tunable Schottky barrier
U2 - 10.1109/TED.2016.2606139
DO - 10.1109/TED.2016.2606139
M3 - Article
SN - 0018-9383
VL - 63
SP - 4521
EP - 4526
JO - IEEE Transactions on Electron Devices
JF - IEEE Transactions on Electron Devices
IS - 11
M1 - 7582491
ER -