Stochastic modeling of progressive breakdown in ultrathin SiO2 films

E. Miranda; A. Cester; A. Paccagnella

doi:10.1063/1.1634372

Stochastic modeling of progressive breakdown in ultrathin SiO₂ films

E. Miranda^*, A. Cester, A. Paccagnella

^*Autor correspondiente de este trabajo

Departamento de Ingeniería Electrónica

Producción científica: Contribución a una revista › Artículo › Investigación › revisión exhaustiva

5 Citas (Scopus)

Resumen

Progressive breakdown dynamics of ultrathin SiO₂ films is described by the stochastic logistic differential equation. For completeness, particular breakdown cases corresponding to reverting processes are also included.

Idioma original	Inglés
Páginas (desde-hasta)	5014-5016
Número de páginas	3
Publicación	Applied physics letters
Volumen	83
N.º	24
DOI	https://doi.org/10.1063/1.1634372
Estado	Publicada - 15 dic 2003

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@article{fd5736ee0077492ca7ad941fbe68c3e4,

title = "Stochastic modeling of progressive breakdown in ultrathin SiO2 films",

abstract = "Progressive breakdown dynamics of ultrathin SiO2 films is described by the stochastic logistic differential equation. For completeness, particular breakdown cases corresponding to reverting processes are also included.",

author = "E. Miranda and A. Cester and A. Paccagnella",

year = "2003",

month = dec,

day = "15",

doi = "10.1063/1.1634372",

language = "English",

volume = "83",

pages = "5014--5016",

journal = "Applied physics letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "24",

}

TY - JOUR

T1 - Stochastic modeling of progressive breakdown in ultrathin SiO2 films

AU - Miranda, E.

AU - Cester, A.

AU - Paccagnella, A.

PY - 2003/12/15

Y1 - 2003/12/15

N2 - Progressive breakdown dynamics of ultrathin SiO2 films is described by the stochastic logistic differential equation. For completeness, particular breakdown cases corresponding to reverting processes are also included.

AB - Progressive breakdown dynamics of ultrathin SiO2 films is described by the stochastic logistic differential equation. For completeness, particular breakdown cases corresponding to reverting processes are also included.

UR - http://www.scopus.com/inward/record.url?scp=0346503157&partnerID=8YFLogxK

U2 - 10.1063/1.1634372

DO - 10.1063/1.1634372

M3 - Article

AN - SCOPUS:0346503157

SN - 0003-6951

VL - 83

SP - 5014

EP - 5016

JO - Applied physics letters

JF - Applied physics letters

IS - 24

ER -