Resumen
We report on the reduction of the thermal conductivity in ultra-thin suspended Si membranes with high crystalline quality. A series of membranes with thicknesses ranging from 9 nm to 1.5 μm was investigated using Raman thermometry, a novel contactless technique for thermal conductivity determination. A systematic decrease in the thermal conductivity was observed as reducing the thickness, which is explained using the Fuchs-Sondheimer model through the influence of phonon boundary scattering at the surfaces. The thermal conductivity of the thinnest membrane with d = 9 nm resulted in (9 ± 2) W/mK, thus approaching the amorphous limit but still maintaining a high crystalline quality. © 2014 Author(s).
| Idioma original | Inglés |
|---|---|
| Número de artículo | 012113 |
| Publicación | APL Materials |
| Volumen | 2 |
| N.º | 1 |
| DOI | |
| Estado | Publicada - 1 ene 2014 |
Huella
Profundice en los temas de investigación de 'Reduction of the thermal conductivity in free-standing silicon nano-membranes investigated by non-invasive Raman thermometry'. En conjunto forman una huella única.Citar esto
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