Quasifree Mg-H thin ﬁlms

Antoni. Baldi Coll; V. Palmisano; Marta González Silveira; Y. Pivak; M. Slaman; H. Schreuders; B. Dam; R. Griessen

doi:10.1063/1.3210791

Quasifree Mg-H thin ﬁlms

Antoni. Baldi Coll, V. Palmisano, Marta González Silveira, Y. Pivak, M. Slaman, H. Schreuders, B. Dam, R. Griessen

Univ Amsterdam, University of Amsterdam, Academic Medical Center Amsterdam, Vrije Universiteit Amsterdam, Acad Med Ctr, Dept Pathol

Producción científica: Contribución a una revista › Artículo › Investigación › revisión exhaustiva

61 Citas (Web of Science)

Resumen

The thermodynamics of hydrogen absorption in Pd-capped Mgfilms are strongly dependent on the magnesium thickness. In the present work, we suppress such dependency by inserting a thin Ti layer between Mg and Pd. By means of optical measurements, we show that the surface energy contribution to the destabilization of MgH2 is negligible. The inserted Ti layer prevents Mg-Pd alloy formation at the Mg/Pd interface, leading to quasifree Mgfilms and enhancing the kinetics of hydrogen desorption. Our observations are important for the development of thin film devices.

Idioma original	Inglés
Páginas (desde-hasta)	#071903/1-071903/3
Publicación	Applied Physics Letters
Volumen	95
N.º	7
DOI	https://doi.org/10.1063/1.3210791
Estado	Publicada - 2009

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@article{4dd3b9edfe744ada8875724f47809142,

title = "Quasifree Mg-H thin ﬁlms",

abstract = "The thermodynamics of hydrogen absorption in Pd-capped Mgfilms are strongly dependent on the magnesium thickness. In the present work, we suppress such dependency by inserting a thin Ti layer between Mg and Pd. By means of optical measurements, we show that the surface energy contribution to the destabilization of MgH2 is negligible. The inserted Ti layer prevents Mg-Pd alloy formation at the Mg/Pd interface, leading to quasifree Mgfilms and enhancing the kinetics of hydrogen desorption. Our observations are important for the development of thin film devices.",

keywords = "Magnesium, Hydrogen storage, Metallic thin films, Elasticity, Thermodynamic properties, Desorption, Sputter deposition, Thin films, Enthalpy, Solution thermodynamics",

author = "{Baldi Coll}, Antoni. and V. Palmisano and {Gonz{\'a}lez Silveira}, Marta and Y. Pivak and M. Slaman and H. Schreuders and B. Dam and R. Griessen",

year = "2009",

doi = "10.1063/1.3210791",

language = "English",

volume = "95",

pages = "#071903/1--071903/3",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "7",

}

TY - JOUR

T1 - Quasifree Mg-H thin ﬁlms

AU - Baldi Coll, Antoni.

AU - Palmisano, V.

AU - González Silveira, Marta

AU - Pivak, Y.

AU - Slaman, M.

AU - Schreuders, H.

AU - Dam, B.

AU - Griessen, R.

PY - 2009

Y1 - 2009

N2 - The thermodynamics of hydrogen absorption in Pd-capped Mgfilms are strongly dependent on the magnesium thickness. In the present work, we suppress such dependency by inserting a thin Ti layer between Mg and Pd. By means of optical measurements, we show that the surface energy contribution to the destabilization of MgH2 is negligible. The inserted Ti layer prevents Mg-Pd alloy formation at the Mg/Pd interface, leading to quasifree Mgfilms and enhancing the kinetics of hydrogen desorption. Our observations are important for the development of thin film devices.

AB - The thermodynamics of hydrogen absorption in Pd-capped Mgfilms are strongly dependent on the magnesium thickness. In the present work, we suppress such dependency by inserting a thin Ti layer between Mg and Pd. By means of optical measurements, we show that the surface energy contribution to the destabilization of MgH2 is negligible. The inserted Ti layer prevents Mg-Pd alloy formation at the Mg/Pd interface, leading to quasifree Mgfilms and enhancing the kinetics of hydrogen desorption. Our observations are important for the development of thin film devices.

KW - Magnesium

KW - Hydrogen storage

KW - Metallic thin films

KW - Elasticity

KW - Thermodynamic properties

KW - Desorption

KW - Sputter deposition

KW - Thin films

KW - Enthalpy

KW - Solution thermodynamics

U2 - 10.1063/1.3210791

DO - 10.1063/1.3210791

M3 - Article

SN - 0003-6951

VL - 95

SP - #071903/1-071903/3

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 7

ER -

Quasifree Mg-H thin ﬁlms

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