Propagation of the SiO2 breakdown event on MOS structures observed with conductive atomic force microscopy

M. Porti, M. Nafría, X. Aymerich, A. Olbrich, B. Ebersberger

Producción científica: Contribución a una revista › Artículo › Investigación › revisión exhaustiva

Idioma original	Inglés
Páginas (desde-hasta)	265-269
Publicación	Microelectronic Engineering
Volumen	59
N.º	1-4
DOI	https://doi.org/10.1016/S0167-9317(01)00608-6
Estado	Publicada - 1 ene 2001

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title = "Propagation of the SiO2 breakdown event on MOS structures observed with conductive atomic force microscopy",

author = "M. Porti and M. Nafr{\'i}a and X. Aymerich and A. Olbrich and B. Ebersberger",

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AU - Porti, M.

AU - Nafría, M.

AU - Aymerich, X.

AU - Olbrich, A.

AU - Ebersberger, B.

PY - 2001/1/1

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UR - https://www.scopus.com/pages/publications/0035498674

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JF - Microelectronic Engineering

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