Frequency dependence of degradation and breakdown of thin SiO2 films

M. Nafría, D. Yélamos, J. Suñé, X. Aymerich

Producción científica: Contribución a una revista › Artículo › Investigación

Idioma original	Inglés
Páginas (desde-hasta)	257-261
Publicación	Quality & Reliability Engineering International
Volumen	11
Estado	Publicada - 1 ene 1995

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@article{ccd8b6f904c4415d9efb0c29a3bb2a3c,

title = "Frequency dependence of degradation and breakdown of thin SiO2 films",

author = "M. Nafr{\'i}a and D. Y{\'e}lamos and J. Su{\~n}{\'e} and X. Aymerich",

year = "1995",

month = jan,

day = "1",

language = "English",

volume = "11",

pages = "257--261",

journal = "Quality & Reliability Engineering International",

issn = "0748-8017",

publisher = "John Wiley and Sons Ltd",

}