Field-effect control of breakdown paths in HfO2 based MIM structures

X. Saura, X. Lian, D. Jiménez, E. Miranda, X. Borrisé, F. Campabadal, J. Suñé

Producción científica: Contribución a una revista › Artículo › Investigación

1 Cita (Scopus)

Idioma original	Inglés
Páginas (desde-hasta)	1346-1350
Publicación	Microelectronics Reliability
Volumen	53
N.º	9-11
DOI	https://doi.org/10.1016/j.microrel.2013.07.061
Estado	Publicada - 1 ene 2013

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title = "Field-effect control of breakdown paths in HfO2 based MIM structures",

author = "X. Saura and X. Lian and D. Jim{\'e}nez and E. Miranda and X. Borris{\'e} and F. Campabadal and J. Su{\~n}{\'e}",

year = "2013",

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day = "1",

doi = "10.1016/j.microrel.2013.07.061",

language = "English",

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TY - JOUR

T1 - Field-effect control of breakdown paths in HfO2 based MIM structures

AU - Saura, X.

AU - Lian, X.

AU - Jiménez, D.

AU - Miranda, E.

AU - Borrisé, X.

AU - Campabadal, F.

AU - Suñé, J.

PY - 2013/1/1

Y1 - 2013/1/1

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DO - 10.1016/j.microrel.2013.07.061

M3 - Article

SN - 0026-2714

VL - 53

SP - 1346

EP - 1350

JO - Microelectronics Reliability

JF - Microelectronics Reliability

IS - 9-11

ER -