UHV CAFM characterization of high-k dielectrics: effect of the technique resolution on the pre- and post-breakdown electrical measurements

M. Lanza, M. Porti, M. Nafría, X. Aymerich, E. Whittaker, B. Hamilton

Research output: Contribution to journalArticleResearch

28 Citations (Scopus)
Original languageEnglish
Pages (from-to)1312-1315
JournalMicroelectronics and Reliability
Volume50
Issue number9-11
DOIs
Publication statusPublished - 1 Apr 2010

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