Original language | English |
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Pages (from-to) | 1127-1131 |
Journal | Microelectronics Reliability |
Volume | 38 |
Publication status | Published - 1 Jun 1998 |
Two-Step Stress Method for the Dynamic Testing of Very Thin (8nm) SiO2 Films
R. Rodríguez, E. Miranda, M. Nafría, J. Suñé, X. Aymerich
Research output: Contribution to journal › Article › Research
1
Citation
(Scopus)