Trapped Charge Distributions in Thin (10 nm) SiO2 Films Subjected to Static and Dynamic Stresses

    Research output: Contribution to journalArticleResearch

    33 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)881-888
    JournalIEEE Transactions on Electron Devices
    Volume45
    Publication statusPublished - 1 Apr 1998

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