| Translated title of the contribution | The thermal growth of very thin SiO2 films: a diffusion-controlled process |
|---|---|
| Original language | Multiple languages |
| Pages (from-to) | 167-175 |
| Journal | Physica status solidi. A, Applied research |
| Volume | 114 |
| Publication status | Published - 1 Jan 1989 |
The thermal growth of very thin SiO2 films: a diffusion-controlled process
E. Farrés, J. Suñé, I. Placencia, N. Barniol, X. Aymerich
Research output: Contribution to journal › Article › Research
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