The thermal growth of very thin SiO2 films: a diffusion-controlled process

Translated title of the contribution: The thermal growth of very thin SiO2 films: a diffusion-controlled process

E. Farrés, J. Suñé, I. Placencia, N. Barniol, X. Aymerich

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1 Citation (Scopus)
Translated title of the contributionThe thermal growth of very thin SiO2 films: a diffusion-controlled process
Original languageMultiple languages
Pages (from-to)167-175
JournalPhysica status solidi. A, Applied research
Volume114
Publication statusPublished - 1 Jan 1989

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Farrés, E., Suñé, J., Placencia, I., Barniol, N., & Aymerich, X. (1989). The thermal growth of very thin SiO2 films: a diffusion-controlled process. Physica status solidi. A, Applied research, 114, 167-175.