The assessment of nonuniform pupils in photolithography

J. Campos; J. C. Escalera; R. Hild; R. Muschall; G. Nitzsche; M. J. Yzuel

doi:10.1016/0167-9317(95)00204-9

The assessment of nonuniform pupils in photolithography

J. Campos, J. C. Escalera, R. Hild, R. Muschall, G. Nitzsche, M. J. Yzuel

Research output: Contribution to journal › Article › Research › peer-review

2 Citations (Scopus)

Abstract

Axial and/or radial apodizing as well as hyperresolving filters are filters which may be used to produce small isolated and L/S-structures in photolithography. For the assessment of the different filters a consequent extension from the 3D-PSF to the 3D-line responses and the 3D-MTF is made. Additionally the OTF and the ATF for partially coherent illumination are regarded. As an example the application of all of these functions to an axial apodizer is presented.

Original language	English
Pages (from-to)	103-106
Journal	Microelectronic Engineering
Volume	30
Issue number	1-4
DOIs	https://doi.org/10.1016/0167-9317(95)00204-9
Publication status	Published - 1 Jan 1996

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Campos, J., Escalera, J. C., Hild, R., Muschall, R., Nitzsche, G., & Yzuel, M. J. (1996). The assessment of nonuniform pupils in photolithography. Microelectronic Engineering, 30(1-4), 103-106. https://doi.org/10.1016/0167-9317(95)00204-9

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