Study of the influence of nonuniforms pupils in photolithographic systems trough the apparent transfer function

M.J. Yzuel, R. Hild, J. Campos, J. C. Escalera

Research output: Contribution to journal › Article › Research

Original language	English
Pages (from-to)	369-377
Journal	Proceedings of SPIE, The international Society for Optical Engineering
Volume	2774
DOIs	https://doi.org/10.1117/12.246680
Publication status	Published - 1 Jan 1996

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title = "Study of the influence of nonuniforms pupils in photolithographic systems trough the apparent transfer function",

author = "M.J. Yzuel and R. Hild and J. Campos and Escalera, {J. C.}",

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T1 - Study of the influence of nonuniforms pupils in photolithographic systems trough the apparent transfer function

AU - Yzuel, M.J.

AU - Hild, R.

AU - Campos, J.

AU - Escalera, J. C.

PY - 1996/1/1

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DO - 10.1117/12.246680

M3 - Article

SN - 0277-786X

VL - 2774

SP - 369

EP - 377

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

ER -