Study of the influence of nonuniforms pupils in photolithographic systems trough the apparent transfer function

M.J. Yzuel, R. Hild, J. Campos, J. C. Escalera

Research output: Contribution to journalArticleResearch

2 Citations (Scopus)
Original languageEnglish
Pages (from-to)369-377
JournalProceedings of SPIE, The international Society for Optical Engineering
Publication statusPublished - 1 Jan 1996

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