Study of the influence of nonuniform pupils in photolitographic systems through the apparent transfer function

M.J. Yzuel, R. Hild, J. Campos, J.C. Escalera

Research output: Contribution to journalArticleResearch

Original languageEnglish
Pages (from-to)369-377
JournalProc. - SPIE
Volume0
Issue number2774
Publication statusPublished - 1 Jan 1996

Cite this

Yzuel, M. J., Hild, R., Campos, J., & Escalera, J. C. (1996). Study of the influence of nonuniform pupils in photolitographic systems through the apparent transfer function. Proc. - SPIE, 0(2774), 369-377.