Stress-profile characterization and test-structure analysis of single and double ion-implanted LPCVD polycrystalline silicon

M.A. Benítez, L. Fonseca, J. Esteve, M.S. Benrakkad, J.R. Morante, J. Samitier, J.A. Schweitz

    Research output: Contribution to journalArticleResearch

    14 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)1-1
    JournalSens. actuators, A, Phys.
    Volume54
    Publication statusPublished - 1 Jan 1996

    Cite this

    Benítez, M. A., Fonseca, L., Esteve, J., Benrakkad, M. S., Morante, J. R., Samitier, J., & Schweitz, J. A. (1996). Stress-profile characterization and test-structure analysis of single and double ion-implanted LPCVD polycrystalline silicon. Sens. actuators, A, Phys., 54, 1-1.