Stress in poly-SiC films grown by low pressure CVD

J. Rodríguez-Viejo, E. Hurtós, R. Kressmann, M.T. Clavaguera-Mora

Research output: Contribution to journalArticleResearch

1 Citation (Scopus)
Original languageEnglish
Pages (from-to)477-482
JournalMat. sci. forum
Volume347
Issue number3
Publication statusPublished - 1 Jan 2000

Cite this

Rodríguez-Viejo, J., Hurtós, E., Kressmann, R., & Clavaguera-Mora, M. T. (2000). Stress in poly-SiC films grown by low pressure CVD. Mat. sci. forum, 347(3), 477-482.