Soft breakdown in ultrathin SiO2 layers: the conduction problem from a new point of view.

Research output: Contribution to journal › Article › Research

Original language	English
Pages (from-to)	2223-2226
Journal	Japanese Journal of Applied Physics
Volume	38
Publication status	Published - 1 Jan 1999

Cite this

@article{65e8b3c9598b44bf97f1fdcbeacd63c6,

title = "Soft breakdown in ultrathin SiO2 layers: the conduction problem from a new point of view.",

author = "E. Miranda and J. Su{\~n}{\'e} and R. Rodr{\'i}guez and M. Nafria and F. Mart{\'i}n and X. Aymerich",

year = "1999",

month = jan,

day = "1",

language = "English",

volume = "38",

pages = "2223--2226",

journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

}

TY - JOUR

T1 - Soft breakdown in ultrathin SiO2 layers: the conduction problem from a new point of view.

AU - Miranda, E.

AU - Suñé, J.

AU - Rodríguez, R.

AU - Nafria, M.

AU - Martín, F.

AU - Aymerich, X.

PY - 1999/1/1

Y1 - 1999/1/1

M3 - Article

VL - 38

SP - 2223

EP - 2226

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

ER -