Original language | English |
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Pages (from-to) | 82-89 |
Journal | IEEE Transactions on Electron Devices |
Volume | 47 |
DOIs | |
Publication status | Published - 1 Jan 2000 |
Soft Breakdown Conduction in Ultrathin (3-5 nm) Gate Dielectrics
E. Miranda, J. Suñé, R. Rodríguez, M. Nafría, X. Aymerich, L. Fonseca, F. Campabadal
Research output: Contribution to journal › Article › Research
102
Citations
(Scopus)