Soft Breakdown Conduction in Ultrathin (3-5 nm) Gate Dielectrics

E. Miranda, J. Suñé, R. Rodríguez, M. Nafría, X. Aymerich, L. Fonseca, F. Campabadal

Research output: Contribution to journalArticleResearch

102 Citations (Scopus)
Original languageEnglish
Pages (from-to)82-89
JournalIEEE Transactions on Electron Devices
Volume47
DOIs
Publication statusPublished - 1 Jan 2000

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