| Translated title of the contribution | Si-SiO2 interfacial atomic scale roughness caused by inhomogeneous oxidation |
|---|---|
| Original language | Multiple languages |
| Pages (from-to) | 83-96 |
| Journal | Physica status solidi. A, Applied research |
| Volume | 113 |
| Publication status | Published - 1 Jan 1989 |
Si-SiO2 interfacial atomic scale roughness caused by inhomogeneous oxidation
E. Farrés, J. Suñé, I. Placencia, N. Barniol, X. Aymerich
Research output: Contribution to journal › Article › Research
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