TY - JOUR
T1 - Sequential Infiltration of Self-Assembled Block Copolymers: A Study by Atomic Force Microscopy
AU - Lorenzoni, Matteo
AU - Evangelio, Laura
AU - Fernández-Regúlez, Marta
AU - Nicolet, Célia
AU - Navarro, Christophe
AU - Pérez-Murano, Francesc
PY - 2017/2/9
Y1 - 2017/2/9
N2 - © 2017 American Chemical Society. Sequential infiltration synthesis (SIS), when combined with novel polymeric materials capable of self-assembly, such as block copolymers (BCPs), has been shown to effectively improve the pattern transfer of nanoscale templates. Herein, we present a study of the SIS process aimed at elucidating some critical aspects such as the evolution of the BCP morphology and mechanical properties after infiltration. Atomic force microscopy nanomechanical mapping was able to measure a consistent stiffness change within the SIS-infiltrated poly(methyl methacrylate) (PMMA) blocks. Interestingly, the increase in Young's modulus of the infiltrated blocks is small compared to the final stiffening of the same infiltrated features after a treatment with oxygen plasma.
AB - © 2017 American Chemical Society. Sequential infiltration synthesis (SIS), when combined with novel polymeric materials capable of self-assembly, such as block copolymers (BCPs), has been shown to effectively improve the pattern transfer of nanoscale templates. Herein, we present a study of the SIS process aimed at elucidating some critical aspects such as the evolution of the BCP morphology and mechanical properties after infiltration. Atomic force microscopy nanomechanical mapping was able to measure a consistent stiffness change within the SIS-infiltrated poly(methyl methacrylate) (PMMA) blocks. Interestingly, the increase in Young's modulus of the infiltrated blocks is small compared to the final stiffening of the same infiltrated features after a treatment with oxygen plasma.
U2 - 10.1021/acs.jpcc.6b11233
DO - 10.1021/acs.jpcc.6b11233
M3 - Article
SN - 1932-7447
VL - 121
SP - 3078
EP - 3086
JO - Journal of Physical Chemistry C
JF - Journal of Physical Chemistry C
IS - 5
ER -