Residual stress of free-standing membranes of yttria-stabilized zirconia for micro solid oxide fuel cell applications

Albert Tarancón*, Neus Sabaté, Andrea Cavallaro, Isabel Gràcia, Jaume Roqueta, Inigo Garbayo, Juan P. Esquivel, Gemma Garcia, Carles Cané, José Santiso

*Corresponding author for this work

Research output: Contribution to journalArticleResearchpeer-review

17 Citations (Scopus)

Abstract

The present study is devoted to analyze the compatibility of yttria-stabilized zirconia thin films prepared by pulsed laser deposition and metalorganic chemical vapor deposition techniques, with microfabrication processes based on silicon technologies for micro solid oxide fuel cells applications. Deposition of yttria-stabilized zirconia on Si/SiO 2/Si 3N 4 substrates was optimized for both techniques in order to obtain high density and homogeneity, as well as a good crystallinity for film thicknesses ranging from 60 to 240 nm. In addition, stabilized zirconia free-standing membranes were fabricated from the deposited films with surface areas between 50 × 50 μm 2 and 820 × 820 μm 2. Particular emphasis was made on the analysis of the effect of the nature of the deposition technique and the different design and fabrication parameters (membrane area, thickness and substrate deposition temperature) on the residual stress of the membranes in order to control their thermomechanical stability for application as electrolyte in micro solid oxide fuel cells.

Original languageEnglish
Pages (from-to)1327-1337
Number of pages11
JournalJournal of Nanoscience and Nanotechnology
Volume10
Issue number2
DOIs
Publication statusPublished - Feb 2010

Keywords

  • Membrane
  • MicroSOFC
  • MOCVD
  • PLD
  • SOFC
  • YSZ

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