Propagation of the SiO2 breakdown event on MOS structures observed with conductive atomic force microscopy

M. Porti, M. Nafría, X. Aymerich, A. Olbrich, B. Ebersberger

    Research output: Contribution to journalArticleResearch

    18 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)265-269
    JournalMicroelectronic Engineering
    Volume59
    Issue number1-4
    DOIs
    Publication statusPublished - 1 Jan 2001

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