Post-breakdown electrical characterization of ultrathin SiO2 films with conductive atomic force microscopy,

M. Porti, M. Nafría, X. Aymerich, A. Olbrich, B. Ebersberger

    Research output: Contribution to journalArticleResearch

    2 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)388-391
    JournalNanotechnology
    Volume13
    Publication statusPublished - 1 Jan 2002

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