Polymer photonic band-gaps fabricated by nanoimprint lithography

V. Reboud, T. Kehoe, J. Romero Vivas, N. Kehagias, M. Zelsmann, F. Alsina, C. M. Sotomayor Torres

    Research output: Contribution to journalArticleResearchpeer-review

    5 Citations (Scopus)

    Abstract

    We report on the fabrication and characterization of photonic band-gaps structures by nanoimprint lithography in a dye-doped polymer. Photonic band calculations show that photonic crystal slabs composed of a triangular array of polymer pillars could exhibit photonic band-gaps for the magnetic-like modes. The resulting structures show that the nanoimprint lithography process is well-suited to fabricate in a single-step process, these challenging photonic structures opening perspectives to realize integrated photonic band-gap circuits. © 2012 Elsevier B.V. All rights reserved.
    Original languageEnglish
    Pages (from-to)632-635
    JournalPhotonics and Nanostructures - Fundamentals and Applications
    Volume10
    Issue number4
    DOIs
    Publication statusPublished - 1 Oct 2012

    Keywords

    • Nanoimpression
    • Photonic band gap
    • Photonic crystal

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