Polymer photonic band-gaps fabricated by nanoimprint lithography

V. Reboud; T. Kehoe; J. Romero Vivas; N. Kehagias; M. Zelsmann; F. Alsina; C. M. Sotomayor Torres

doi:10.1016/j.photonics.2012.06.001

Polymer photonic band-gaps fabricated by nanoimprint lithography

V. Reboud, T. Kehoe, J. Romero Vivas, N. Kehagias, M. Zelsmann, F. Alsina, C. M. Sotomayor Torres

Research output: Contribution to journal › Article › Research › peer-review

6 Citations (Scopus)

Abstract

We report on the fabrication and characterization of photonic band-gaps structures by nanoimprint lithography in a dye-doped polymer. Photonic band calculations show that photonic crystal slabs composed of a triangular array of polymer pillars could exhibit photonic band-gaps for the magnetic-like modes. The resulting structures show that the nanoimprint lithography process is well-suited to fabricate in a single-step process, these challenging photonic structures opening perspectives to realize integrated photonic band-gap circuits. © 2012 Elsevier B.V. All rights reserved.

Original language	English
Pages (from-to)	632-635
Journal	Photonics and Nanostructures - Fundamentals and Applications
Volume	10
Issue number	4
DOIs	https://doi.org/10.1016/j.photonics.2012.06.001
Publication status	Published - 1 Oct 2012

Keywords

Nanoimpression
Photonic band gap
Photonic crystal

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10.1016/j.photonics.2012.06.001

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title = "Polymer photonic band-gaps fabricated by nanoimprint lithography",

abstract = "We report on the fabrication and characterization of photonic band-gaps structures by nanoimprint lithography in a dye-doped polymer. Photonic band calculations show that photonic crystal slabs composed of a triangular array of polymer pillars could exhibit photonic band-gaps for the magnetic-like modes. The resulting structures show that the nanoimprint lithography process is well-suited to fabricate in a single-step process, these challenging photonic structures opening perspectives to realize integrated photonic band-gap circuits. {\textcopyright} 2012 Elsevier B.V. All rights reserved.",

keywords = "Nanoimpression, Photonic band gap, Photonic crystal",

author = "V. Reboud and T. Kehoe and {Romero Vivas}, J. and N. Kehagias and M. Zelsmann and F. Alsina and {Sotomayor Torres}, {C. M.}",

year = "2012",

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doi = "10.1016/j.photonics.2012.06.001",

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journal = "Photonics and Nanostructures - Fundamentals and Applications",

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TY - JOUR

T1 - Polymer photonic band-gaps fabricated by nanoimprint lithography

AU - Reboud, V.

AU - Kehoe, T.

AU - Romero Vivas, J.

AU - Kehagias, N.

AU - Zelsmann, M.

AU - Alsina, F.

AU - Sotomayor Torres, C. M.

PY - 2012/10/1

Y1 - 2012/10/1

N2 - We report on the fabrication and characterization of photonic band-gaps structures by nanoimprint lithography in a dye-doped polymer. Photonic band calculations show that photonic crystal slabs composed of a triangular array of polymer pillars could exhibit photonic band-gaps for the magnetic-like modes. The resulting structures show that the nanoimprint lithography process is well-suited to fabricate in a single-step process, these challenging photonic structures opening perspectives to realize integrated photonic band-gap circuits. © 2012 Elsevier B.V. All rights reserved.

AB - We report on the fabrication and characterization of photonic band-gaps structures by nanoimprint lithography in a dye-doped polymer. Photonic band calculations show that photonic crystal slabs composed of a triangular array of polymer pillars could exhibit photonic band-gaps for the magnetic-like modes. The resulting structures show that the nanoimprint lithography process is well-suited to fabricate in a single-step process, these challenging photonic structures opening perspectives to realize integrated photonic band-gap circuits. © 2012 Elsevier B.V. All rights reserved.

KW - Nanoimpression

KW - Photonic band gap

KW - Photonic crystal

U2 - 10.1016/j.photonics.2012.06.001

DO - 10.1016/j.photonics.2012.06.001

M3 - Article

SN - 1569-4410

VL - 10

SP - 632

EP - 635

JO - Photonics and Nanostructures - Fundamentals and Applications

JF - Photonics and Nanostructures - Fundamentals and Applications

IS - 4

ER -

Polymer photonic band-gaps fabricated by nanoimprint lithography

Abstract

Keywords

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