Abstract
The article describes the underlying principles of a photocatalytic method supplied to the recovery of metals in solution. The method is based on the redox processes that take place at the semiconductor particle-electrolyte interface when a sample is illuminated by light having an energy greater than the semiconductor bandgap. In the presence of metallic ions in the solution, with a suitable redox potential with respect to the location of the semiconductor bands edges, metallic deposits are produced on the catalyst surface by reduction of metallic ions by the electrons photogenerated in the semiconductor. The results obtained for the recovery of different metals by means of this photocatalytic method show that the photodeposition process takes place with high yields, even when sunlight is used.
| Original language | English |
|---|---|
| Pages (from-to) | 341-346 |
| Journal | Revista de Metalurgia (Madrid) |
| Volume | 23 |
| Issue number | 5 |
| Publication status | Published - 1 Sep 1987 |