Pattern transfer optimization for the fabrication of arrays of silicon nanowires

Y. Gebremichael; A. Sánchez; X. Borrise; M. Schmidt; A.R. Goñi; M.I. Alonso; R. Rurali; J. Suñé; X. Cartoixà; F. Pérez-Murano

doi:10.1016/j.mee.2009.11.086

Pattern transfer optimization for the fabrication of arrays of silicon nanowires

Y. Gebremichael, A. Sánchez, X. Borrise, M. Schmidt, A.R. Goñi, M.I. Alonso, R. Rurali, J. Suñé, X. Cartoixà, F. Pérez-Murano

Research output: Contribution to journal › Article › Research

1 Citation (Scopus)

Original language	English
Pages (from-to)	1479-1482
Journal	Microelectron. Eng.
Volume	87
Issue number	5-8
DOIs	https://doi.org/10.1016/j.mee.2009.11.086
Publication status	Published - 1 Jan 2010

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10.1016/j.mee.2009.11.086

Cite this

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title = "Pattern transfer optimization for the fabrication of arrays of silicon nanowires",

author = "Y. Gebremichael and A. S{\'a}nchez and X. Borrise and M. Schmidt and A.R. Go{\~n}i and M.I. Alonso and R. Rurali and J. Su{\~n}{\'e} and X. Cartoix{\`a} and F. P{\'e}rez-Murano",

year = "2010",

month = jan,

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AU - Gebremichael, Y.

AU - Sánchez, A.

AU - Borrise, X.

AU - Schmidt, M.

AU - Goñi, A.R.

AU - Alonso, M.I.

AU - Rurali, R.

AU - Suñé, J.

AU - Cartoixà, X.

AU - Pérez-Murano, F.

PY - 2010/1/1

Y1 - 2010/1/1

U2 - 10.1016/j.mee.2009.11.086

DO - 10.1016/j.mee.2009.11.086

M3 - Article

VL - 87

SP - 1479

EP - 1482

JO - Microelectronic Engineering

JF - Microelectronic Engineering

SN - 0167-9317

IS - 5-8

ER -