On the SiO\sub x\nosub transition layer in abrupt Si-SiO\sub 2\nosub chemical interface in MOS structures

J. Suñé, I. Placencia, N. Barniol, E. Farrés, X. Aymerich

Research output: Contribution to journalArticleResearch

Original languageEnglish
Pages (from-to)463-472
JournalSurface Science
Volume0
Issue number208
Publication statusPublished - 1 Jan 1989

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