On the SiO\sub x\nosub Transition Layer in abrupt Si-SiO\sub 2 \nosub Chemical Interface in MOS Structures

J. Suñé, I. Placencia, N. Barniol, X. and Aymerich

Research output: Contribution to journalArticleResearch

13 Citations (Scopus)
Original languageEnglish
Pages (from-to)463-472
JournalSurface Science
Volume0
Issue number208
Publication statusPublished - 1 Jan 1989

Cite this