On the oxide interface microroughness in MOS decives

I. Placencia, J. Suñé, E. Farrés, N. Barniol, X. Aymerich

Research output: Contribution to journalArticleResearch

Original languageEnglish
Pages (from-to)771-774
JournalVacuum
Volume39
Publication statusPublished - 1 Jan 1989

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