On the determination of the Si SiO2 barrier height from the Fowler Nordheim plot

P. Olivo, J. Suñé, B. Riccò

Research output: Contribution to journalArticleResearch

38 Citations (Scopus)
Original languageEnglish
Pages (from-to)620-622
JournalIEEE Electron Device Letters
Volume12
Publication statusPublished - 1 Jan 1991

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