On the determination of the Si SiO2 barrier height from the Fowler Nordheim plot

P. Olivo, J. Suñé, B. Riccò

Research output: Contribution to journal › Article › Research

Original language	English
Pages (from-to)	620-622
Journal	IEEE Electron Device Letters
Volume	12
Publication status	Published - 1 Jan 1991

Cite this

@article{448b85f5e8ad4f21a55d56a2bd315ce6,

title = "On the determination of the Si SiO2 barrier height from the Fowler Nordheim plot",

author = "P. Olivo and J. Su{\~n}{\'e} and B. Ricc{\`o}",

year = "1991",

month = jan,

day = "1",

language = "English",

volume = "12",

pages = "620--622",

journal = "IEEE Electron Device Letters",

issn = "0741-3106",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

}