Original language | English |
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Pages (from-to) | 55-60 |
Journal | IEEE Trans. Nanotechn. |
Volume | 3 |
Issue number | 1 |
DOIs | |
Publication status | Published - 1 Jan 2004 |
Nanometer-scale analysis of current limited stresses impact on SiOsub 2nosub gate oxide reliability using C-AFM
Research output: Contribution to journal › Article › Research
38
Citations
(Scopus)