Nanometer-scale analysis of current limited stresses impact on SiOsub 2nosub gate oxide reliability using C-AFM

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@article{3d7a4a8056df465d95c18ad679b972fd,

title = "Nanometer-scale analysis of current limited stresses impact on SiOsub 2nosub gate oxide reliability using C-AFM",

author = "M. Porti and M. Nafr{\'i}a and X. Aymerich",

year = "2004",

month = jan,

day = "1",

doi = "10.1109/TNANO.2004.824023",

language = "English",

volume = "3",

pages = "55--60",

journal = "IEEE Transactions on Nanotechnology",

issn = "1536-125X",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

number = "1",

}

TY - JOUR

T1 - Nanometer-scale analysis of current limited stresses impact on SiOsub 2nosub gate oxide reliability using C-AFM

AU - Porti, M.

AU - Nafría, M.

AU - Aymerich, X.

PY - 2004/1/1

Y1 - 2004/1/1

U2 - 10.1109/TNANO.2004.824023

DO - 10.1109/TNANO.2004.824023

M3 - Article

VL - 3

SP - 55

EP - 60

JO - IEEE Transactions on Nanotechnology

JF - IEEE Transactions on Nanotechnology

SN - 1536-125X

IS - 1

ER -