TY - JOUR
T1 - Nano-patterning of perpendicular magnetic recording media by low-energy implantation of chemically reactive ions
AU - Martín-González, M. S.
AU - Briones, F.
AU - García-Martín, J. M.
AU - Montserrat, J.
AU - Vila, L.
AU - Faini, G.
AU - Testa, A. M.
AU - Fiorani, D.
AU - Rohrmann, H.
PY - 2010/1/1
Y1 - 2010/1/1
N2 - Magnetic nano-patterning of perpendicular hard disk media with perpendicular anisotropy, but preserving disk surface planarity, is presented here. Reactive ion implantation is used to locally modify the chemical composition (hence the magnetization and magnetic anisotropy) of the Co/Pd multilayer in irradiated areas. The procedure involves low energy, chemically reactive ion irradiation through a resist mask. Among N, P and As ions, P are shown to be most adequate to obtain optimum bit density and topography flatness for industrial Co/Pd multilayer media. The effect of this ion contributes to isolate perpendicular bits by destroying both anisotropy and magnetic exchange in the irradiated areas. Low ion fluences are effective due to the stabilization of atomic displacement levels by the chemical effect of covalent impurities. © 2010 Elsevier B.V. All rights reserved.
AB - Magnetic nano-patterning of perpendicular hard disk media with perpendicular anisotropy, but preserving disk surface planarity, is presented here. Reactive ion implantation is used to locally modify the chemical composition (hence the magnetization and magnetic anisotropy) of the Co/Pd multilayer in irradiated areas. The procedure involves low energy, chemically reactive ion irradiation through a resist mask. Among N, P and As ions, P are shown to be most adequate to obtain optimum bit density and topography flatness for industrial Co/Pd multilayer media. The effect of this ion contributes to isolate perpendicular bits by destroying both anisotropy and magnetic exchange in the irradiated areas. Low ion fluences are effective due to the stabilization of atomic displacement levels by the chemical effect of covalent impurities. © 2010 Elsevier B.V. All rights reserved.
KW - CoPd multilayer
KW - Hard drive
KW - Multilayer medium
KW - Nanoimprint lithography
KW - Perpendicular magnetic recording
U2 - 10.1016/j.jmmm.2010.04.023
DO - 10.1016/j.jmmm.2010.04.023
M3 - Article
VL - 322
SP - 2762
EP - 2768
JO - Journal of Magnetism and Magnetic Materials
JF - Journal of Magnetism and Magnetic Materials
SN - 0304-8853
IS - 18
ER -