Monolithic mass sensor fabricated using a conventional technology with attogram resolution in air conditions

J. Verd; A. Uranga; G. Abadal; J. Teva; F. Torres; F. Ṕrez-Murano; J. Fraxedas; J. Esteve; N. Barniol

doi:https://doi.org/10.1063/1.2753120

Monolithic mass sensor fabricated using a conventional technology with attogram resolution in air conditions

J. Verd, A. Uranga, G. Abadal, J. Teva, F. Torres, F. Ṕrez-Murano, J. Fraxedas, J. Esteve, N. Barniol

Department of Electronic Engineering

Research output: Contribution to journal › Article › Research › peer-review

55 Citations (Scopus)

Abstract

Monolithic mass sensors for ultrasensitive mass detection in air conditions have been fabricated using a conventional 0.35 μm complementary metal-oxide-semiconductor (CMOS) process. The mass sensors are based on electrostatically excited submicrometer scale cantilevers integrated with CMOS electronics. The devices have been calibrated obtaining an experimental sensitivity of 6× 10-11 g cm2 Hz equivalent to 0.9 agHz for locally deposited mass. Results from time-resolved mass measurements are also presented. An evaluation of the mass resolution have been performed obtaining a value of 2.4× 10-17 g in air conditions, resulting in an improvement of these devices from previous works in terms of sensitivity, resolution, and fabrication process complexity. © 2007 American Institute of Physics.

Original language	English
Article number	013501
Journal	Applied Physics Letters
Volume	91
DOIs	https://doi.org/10.1063/1.2753120
Publication status	Published - 19 Nov 2007

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Verd, J., Uranga, A., Abadal, G., Teva, J., Torres, F., Ṕrez-Murano, F., Fraxedas, J., Esteve, J., & Barniol, N. (2007). Monolithic mass sensor fabricated using a conventional technology with attogram resolution in air conditions. Applied Physics Letters, 91, [013501]. https://doi.org/10.1063/1.2753120

@article{72a4141df665458ba9e8e344afe29242,

title = "Monolithic mass sensor fabricated using a conventional technology with attogram resolution in air conditions",

abstract = "Monolithic mass sensors for ultrasensitive mass detection in air conditions have been fabricated using a conventional 0.35 μm complementary metal-oxide-semiconductor (CMOS) process. The mass sensors are based on electrostatically excited submicrometer scale cantilevers integrated with CMOS electronics. The devices have been calibrated obtaining an experimental sensitivity of 6× 10-11 g cm2 Hz equivalent to 0.9 agHz for locally deposited mass. Results from time-resolved mass measurements are also presented. An evaluation of the mass resolution have been performed obtaining a value of 2.4× 10-17 g in air conditions, resulting in an improvement of these devices from previous works in terms of sensitivity, resolution, and fabrication process complexity. {\textcopyright} 2007 American Institute of Physics.",

author = "J. Verd and A. Uranga and G. Abadal and J. Teva and F. Torres and F. Ṕrez-Murano and J. Fraxedas and J. Esteve and N. Barniol",

year = "2007",

month = nov,

day = "19",

doi = "https://doi.org/10.1063/1.2753120",

language = "English",

volume = "91",

}

TY - JOUR

T1 - Monolithic mass sensor fabricated using a conventional technology with attogram resolution in air conditions

AU - Verd, J.

AU - Uranga, A.

AU - Abadal, G.

AU - Teva, J.

AU - Torres, F.

AU - Ṕrez-Murano, F.

AU - Fraxedas, J.

AU - Esteve, J.

AU - Barniol, N.

PY - 2007/11/19

Y1 - 2007/11/19

N2 - Monolithic mass sensors for ultrasensitive mass detection in air conditions have been fabricated using a conventional 0.35 μm complementary metal-oxide-semiconductor (CMOS) process. The mass sensors are based on electrostatically excited submicrometer scale cantilevers integrated with CMOS electronics. The devices have been calibrated obtaining an experimental sensitivity of 6× 10-11 g cm2 Hz equivalent to 0.9 agHz for locally deposited mass. Results from time-resolved mass measurements are also presented. An evaluation of the mass resolution have been performed obtaining a value of 2.4× 10-17 g in air conditions, resulting in an improvement of these devices from previous works in terms of sensitivity, resolution, and fabrication process complexity. © 2007 American Institute of Physics.

AB - Monolithic mass sensors for ultrasensitive mass detection in air conditions have been fabricated using a conventional 0.35 μm complementary metal-oxide-semiconductor (CMOS) process. The mass sensors are based on electrostatically excited submicrometer scale cantilevers integrated with CMOS electronics. The devices have been calibrated obtaining an experimental sensitivity of 6× 10-11 g cm2 Hz equivalent to 0.9 agHz for locally deposited mass. Results from time-resolved mass measurements are also presented. An evaluation of the mass resolution have been performed obtaining a value of 2.4× 10-17 g in air conditions, resulting in an improvement of these devices from previous works in terms of sensitivity, resolution, and fabrication process complexity. © 2007 American Institute of Physics.

U2 - https://doi.org/10.1063/1.2753120

DO - https://doi.org/10.1063/1.2753120

M3 - Article

VL - 91

M1 - 013501

ER -