Abstract
The modification of HF-etched silicon (100) surface with a scanning tunneling microscope (STM) operated in air is studied for the first time in samples subjected to the standard HF etching without the follow-up rinsing in H2O. The modifications are produced in air under normal STM imaging conditions (Vt=-1.4 V and It=2 nA). The simultaneous acquisition of topographical, current image tunneling spectroscopy and local barrier-height images clearly shows that the nature of the modification is not only topographical but also chemical. The features produced with a resolution better than 25 nm are attributed to a tip-induced oxidation enhanced by the presence of fluorine on the surface.
Original language | English |
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Pages (from-to) | 462-464 |
Journal | Applied physics letters |
Volume | 61 |
DOIs | |
Publication status | Published - 1 Dec 1992 |