Lithography guided horizontal growth of silicon nanowires for the fabrication of ultrasensitive piezoresitive strain gauges

M. Fernández-Regúlez, J.A. Plaza, LORA-TAMAYO E., A. San Paulo

Research output: Contribution to journalArticleResearch

13 Citations (Scopus)
Original languageEnglish
Pages (from-to)1270-1273
JournalMicroelectronic Engineering
Volume87
Publication statusPublished - 1 Jan 2010

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