Leakage current through the poly-crystalline HfO<inf>2</inf>: Trap densities at grains and grain boundaries

Keyphrases

• Leakage Current 100%
• Grain Boundary 100%
• HfO2 100%
• Trap Density 100%
• Cm(III) 40%
• Conductive Atomic Force Microscopy (C-AFM) 40%
• Trap-assisted Tunneling 40%
• Am(III) 20%
• Electron Transport 20%
• Hafnia 20%
• Dielectric Thin Films 20%
• Positively Charged 20%
• Oxygen Vacancy 20%
• Charge Transport 20%
• I-V Characteristics 20%
• Energy Parameters 20%
• Tunnel Model 20%
• Electron Traps 20%
• Multiphonon 20%
• Parameter Matching 20%

Engineering

• Tunnel Construction 100%
• Conductive Atomic Force Microscopy 100%
• Charge Transport 50%
• Current-Voltage Characteristic 50%
• Oxygen Vacancy 50%
• Dielectric Films 50%
• Electron Trap 50%

Material Science

• Grain Boundary 100%
• Density 100%
• Atomic Force Microscopy 40%
• Oxygen Vacancy 20%
• Electron Transfer 20%
• Current-Voltage Characteristic 20%
• Dielectric Films 20%