Influence of Vacuum Environment on Conductive AFM measurements of advanced MOS Gate dielectrics

L. Aguilera, W. Polspoel, A. Volodin, C. Van Haesendonck, M. Porti, W. Vandervorst, M. Nafria, X. Aymerich

Research output: Contribution to journalArticleResearch

7 Citations (Scopus)
Original languageEnglish
Pages (from-to)1445-1449
JournalJournal of Vacuum Science & Technology. B,
Volume26
Issue number4
Publication statusPublished - 1 Jan 2008

Cite this