In-line metrology for roll-to-roll UV assisted nanoimprint lithography using diffractometry

Martin Kreuzer, Guy L. Whitworth, Achille Francone, Jordi Gomis-Bresco, Nikolaos Kehagias, Clivia M. Sotomayor-Torres

    Research output: Contribution to journalArticleResearchpeer-review

    9 Citations (Scopus)


    © 2018 Author(s). We describe and discuss the optical design of a diffractometer to carry out in-line quality control during roll-to-roll nanoimprinting. The tool measures diffractograms in reflection geometry, through an aspheric lens to gain fast, non-invasive information of any changes to the critical dimensions of target grating structures. A stepwise tapered linear grating with constant period was fabricated in order to detect the variation in grating linewidth through diffractometry. The minimum feature change detected was ∼40 nm to a precision of 10 nm. The diffractometer was then integrated with a roll-to-roll UV assisted nanoimprint lithography machine to gain dynamic measurements in situ.
    Original languageEnglish
    Article number058502
    JournalAPL Materials
    Issue number5
    Publication statusPublished - 1 May 2018


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