TY - JOUR
T1 - Identifying the nature of surface chemical modification for directed self-assembly of block copolymers
AU - Evangelio, Laura
AU - Gramazio, Federico
AU - Lorenzoni, Matteo
AU - Gorgoi, Michaela
AU - Espinosa, Francisco Miguel
AU - García, Ricardo
AU - Pérez-Murano, Francesc
AU - Fraxedas, Jordi
PY - 2017/1/1
Y1 - 2017/1/1
N2 - © 2017 Evangelio et al. In recent years, block copolymer lithography has emerged as a viable alternative technology for advanced lithography. In chemicalepitaxy- directed self-assembly, the interfacial energy between the substrate and each block copolymer domain plays a key role on the final ordering. Here, we focus on the experimental characterization of the chemical interactions that occur at the interface built between different chemical guiding patterns and the domains of the block copolymers. We have chosen hard X-ray high kinetic energy photoelectron spectroscopy as an exploration technique because it provides information on the electronic structure of buried interfaces. The outcome of the characterization sheds light onto key aspects of directed self-assembly: grafted brush layer, chemical pattern creation and brush/block co-polymer interface.
AB - © 2017 Evangelio et al. In recent years, block copolymer lithography has emerged as a viable alternative technology for advanced lithography. In chemicalepitaxy- directed self-assembly, the interfacial energy between the substrate and each block copolymer domain plays a key role on the final ordering. Here, we focus on the experimental characterization of the chemical interactions that occur at the interface built between different chemical guiding patterns and the domains of the block copolymers. We have chosen hard X-ray high kinetic energy photoelectron spectroscopy as an exploration technique because it provides information on the electronic structure of buried interfaces. The outcome of the characterization sheds light onto key aspects of directed self-assembly: grafted brush layer, chemical pattern creation and brush/block co-polymer interface.
KW - Block copolymer
KW - Chemical guiding pattern
KW - Directed self-assembly
KW - Thin film
KW - X-ray photoemission spectroscopy
UR - https://ddd.uab.cat/record/186356
U2 - https://doi.org/10.3762/bjnano.8.198
DO - https://doi.org/10.3762/bjnano.8.198
M3 - Article
VL - 8
JO - Beilstein Journal of Nanotechnology
JF - Beilstein Journal of Nanotechnology
SN - 2190-4286
IS - 1
M1 - 198
ER -