High-k gate stacks electrical characterization at the nanoscale using conductive-AFM

M. Nafría, M. Porti, X. Blasco, L. Aguilera, X. Aymerich

Research output: Chapter in BookChapterResearch

Original languageEnglish
Title of host publicationDefects in HIgh-k Gate Dielectric Stacks: Nano-Electronic Semiconductor Devices (NATO Science Series II: Mathematics, Physics and Chemistry)
Place of PublicationBerlín (DE)
Pages435-446
Number of pages11
Edition1
Publication statusPublished - 1 Jan 2006

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