Growth morphology of low-pressure metal-organic chemical vapor deposition Silicon Carbide on a -SiO2/Si (100) substrates

J. Rodríguez, N. Clavaguera, M.T. Clavaguera Mora, G. Arnaud, J.J. Pascual, S. Berbrich, J. Millán

Research output: Contribution to journalArticleResearch

3 Citations (Scopus)
Original languageEnglish
Pages (from-to)1-1
JournalMater. sci. technol.
Issue number11
Publication statusPublished - 1 Jan 1995

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