Growth and Characterization of SiC Films Deposited on a-SiO2Si (100) Substrates by LPCVD

J. Rodríguez, N. Clavaguera, Z. El Felk, M.T. Clavaguera-Mora, G. Arnaud, J. Camassel, J. Pascual, S. Berberich, J. Millán

Research output: Contribution to journalArticleResearchpeer-review

Original languageEnglish
Pages (from-to)98-101
JournalMaterials Science and Technology
Issue number12
Publication statusPublished - 1 Jan 1996

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