Grain boundary driven leakage path formation in HfO2 dielectrics

G. Bersuker; J. Yuma; L. Vandelli; A. Padovani; L. Larcher; V. Iglesias; M. Porti; M. Nafria; K. P. McKenna; A. Shluger; P. Kirsch; R. Jammy

Grain boundary driven leakage path formation in HfO2 dielectrics

G. Bersuker, J. Yuma, L. Vandelli, A. Padovani, L. Larcher, V. Iglesias, M. Porti, M. Nafria, K. P. McKenna, A. Shluger, P. Kirsch, R. Jammy

Research output: Contribution to journal › Article › Research

75 Citations (Scopus)

Original language	English
Pages (from-to)	146-150
Journal	Solid-State Electronics
Volume	66
Publication status	Published - 1 Jan 2011

Cite this

@article{cfd3e054056d4fe18af05517d5436d1c,

title = "Grain boundary driven leakage path formation in HfO2 dielectrics",

author = "G. Bersuker and J. Yuma and L. Vandelli and A. Padovani and L. Larcher and V. Iglesias and M. Porti and M. Nafria and McKenna, {K. P.} and A. Shluger and P. Kirsch and R. Jammy",

year = "2011",

month = jan,

day = "1",

language = "English",

volume = "66",

pages = "146--150",

}