Grain boundary driven leakage path formation in HfO2 dielectrics

G. Bersuker, J. Yuma, L. Vandelli, A. Padovani, L. Larcher, V. Iglesias, M. Porti, M. Nafria, K. P. McKenna, A. Shluger, P. Kirsch, R. Jammy

Research output: Contribution to journalArticleResearch

75 Citations (Scopus)
Original languageEnglish
Pages (from-to)146-150
JournalSolid-State Electronics
Volume66
Publication statusPublished - 1 Jan 2011

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