Glass transition in vapor deposited thin films of toluene

E. León-Gutierrez; G. Garcia; M. T. Clavaguera-Mora; J. Rodríguez-Viejo

doi:https://doi.org/10.1016/j.tca.2009.05.016

Glass transition in vapor deposited thin films of toluene

E. León-Gutierrez, G. Garcia, M. T. Clavaguera-Mora, J. Rodríguez-Viejo

Department of Physics

Research output: Contribution to journal › Article › Research › peer-review

61 Citations (Scopus)

Abstract

We report on nanocalorimetric measurements of 50 nm thick toluene films at heating rates spanning 600 to 8 × 104 K/s. The films are grown from the vapour at 90 K directly onto the nanocalorimetric cell. The kinetic and thermodynamic stability of as-deposited films is higher than the stability of films cooled from the supercooled liquid at 2000 K/s. We also show that at those heating rates, the calorimetric Tg does not correlate with the relaxation time obtained by dielectric spectroscopy. © 2009 Elsevier B.V. All rights reserved.

Original language	English
Pages (from-to)	51-54
Number of pages	4
Journal	Thermochimica Acta
Volume	492
Issue number	1-2
DOIs	https://doi.org/10.1016/j.tca.2009.05.016
Publication status	Published - 10 Aug 2009

Keywords

Glass transition
Nanocalorimetry
Relaxation time
Thin films
Toluene

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https://doi.org/10.1016/j.tca.2009.05.016

Cite this

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title = "Glass transition in vapor deposited thin films of toluene",

abstract = "We report on nanocalorimetric measurements of 50 nm thick toluene films at heating rates spanning 600 to 8 × 104 K/s. The films are grown from the vapour at 90 K directly onto the nanocalorimetric cell. The kinetic and thermodynamic stability of as-deposited films is higher than the stability of films cooled from the supercooled liquid at 2000 K/s. We also show that at those heating rates, the calorimetric Tg does not correlate with the relaxation time obtained by dielectric spectroscopy. {\textcopyright} 2009 Elsevier B.V. All rights reserved.",

keywords = "Glass transition, Nanocalorimetry, Relaxation time, Thin films, Toluene",

author = "E. Le{\'o}n-Gutierrez and G. Garcia and Clavaguera-Mora, {M. T.} and J. Rodr{\'i}guez-Viejo",

note = "Funding Information: We acknowledge the former Ministerio de Educaci{\'o}n y Ciencia for support through projects MAT2007-61521 and FIS2006-26391 EXPLORA and the Generalitat de Catalunya through project SGR2005-00201. ELG thanks MEC for FPI fellowship.",

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AU - León-Gutierrez, E.

AU - Garcia, G.

AU - Clavaguera-Mora, M. T.

AU - Rodríguez-Viejo, J.

N1 - Funding Information: We acknowledge the former Ministerio de Educación y Ciencia for support through projects MAT2007-61521 and FIS2006-26391 EXPLORA and the Generalitat de Catalunya through project SGR2005-00201. ELG thanks MEC for FPI fellowship.

PY - 2009/8/10

Y1 - 2009/8/10

N2 - We report on nanocalorimetric measurements of 50 nm thick toluene films at heating rates spanning 600 to 8 × 104 K/s. The films are grown from the vapour at 90 K directly onto the nanocalorimetric cell. The kinetic and thermodynamic stability of as-deposited films is higher than the stability of films cooled from the supercooled liquid at 2000 K/s. We also show that at those heating rates, the calorimetric Tg does not correlate with the relaxation time obtained by dielectric spectroscopy. © 2009 Elsevier B.V. All rights reserved.

AB - We report on nanocalorimetric measurements of 50 nm thick toluene films at heating rates spanning 600 to 8 × 104 K/s. The films are grown from the vapour at 90 K directly onto the nanocalorimetric cell. The kinetic and thermodynamic stability of as-deposited films is higher than the stability of films cooled from the supercooled liquid at 2000 K/s. We also show that at those heating rates, the calorimetric Tg does not correlate with the relaxation time obtained by dielectric spectroscopy. © 2009 Elsevier B.V. All rights reserved.

KW - Glass transition

KW - Nanocalorimetry

KW - Relaxation time

KW - Thin films

KW - Toluene

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SN - 0040-6031

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EP - 54

JO - Thermochimica Acta

JF - Thermochimica Acta

IS - 1-2

ER -

Glass transition in vapor deposited thin films of toluene

Abstract

Keywords

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