Full water integration of NEMS on CMOS by nanostencil lithography

J. Arcamone; M.A.F. Van de Boogaart; F. Serra-Graells; Francisco Torres Canals; Gabriel Abadal Berini; Nuria Barniol Beumala; Francesc Xavier Perez Murano

doi:10.1109/IEDM.2006.346830

Full water integration of NEMS on CMOS by nanostencil lithography

J. Arcamone, M.A.F. Van de Boogaart, F. Serra-Graells, Francisco Torres Canals, Gabriel Abadal Berini, Nuria Barniol Beumala, Francesc Xavier Perez Murano

Department of Electronic Engineering

Research output: Contribution to journal › Article › Research

8 Citations (Scopus)

Original language	English
Pages (from-to)	1-1
Journal	Tech. dig., Int. Electron Devices Meet.
Volume	1
DOIs	https://doi.org/10.1109/IEDM.2006.346830
Publication status	Published - 1 Jan 2006

Access to Document

10.1109/IEDM.2006.346830

Cite this

Arcamone, J., Van de Boogaart, M. A. F., Serra-Graells, F., Torres Canals, F., Abadal Berini, G., Barniol Beumala, N., & Perez Murano, F. X. (2006). Full water integration of NEMS on CMOS by nanostencil lithography. Tech. dig., Int. Electron Devices Meet., 1, 1-1. https://doi.org/10.1109/IEDM.2006.346830

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