Full water integration of NEMS on CMOS by nanostencil lithography

J. Arcamone, M.A.F. Van de Boogaart, F. Serra-Graells, Francisco Torres Canals, Gabriel Abadal Berini, Nuria Barniol Beumala, Francesc Xavier Perez Murano

Research output: Contribution to journalArticleResearch

8 Citations (Scopus)
Original languageEnglish
Pages (from-to)1-1
JournalTech. dig., Int. Electron Devices Meet.
Volume1
DOIs
Publication statusPublished - 1 Jan 2006

Cite this

Arcamone, J., Van de Boogaart, M. A. F., Serra-Graells, F., Torres Canals, F., Abadal Berini, G., Barniol Beumala, N., & Perez Murano, F. X. (2006). Full water integration of NEMS on CMOS by nanostencil lithography. Tech. dig., Int. Electron Devices Meet., 1, 1-1. https://doi.org/10.1109/IEDM.2006.346830