Original language | English |
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Pages (from-to) | 1-1 |
Journal | Tech. dig., Int. Electron Devices Meet. |
Volume | 1 |
DOIs | |
Publication status | Published - 1 Jan 2006 |
Full water integration of NEMS on CMOS by nanostencil lithography
J. Arcamone, M.A.F. Van de Boogaart, F. Serra-Graells, Francisco Torres Canals, Gabriel Abadal Berini, Nuria Barniol Beumala, Francesc Xavier Perez Murano
Research output: Contribution to journal › Article › Research
8
Citations
(Scopus)