Full water integration of NEMS on CMOS by nanostencil lithography

J. Arcamone; M.A.F. Van de Boogaart; F. Serra-Graells; Francisco Torres Canals; Gabriel Abadal Berini; Nuria Barniol Beumala; Francesc Xavier Perez Murano

doi:10.1109/IEDM.2006.346830

Full water integration of NEMS on CMOS by nanostencil lithography

J. Arcamone, M.A.F. Van de Boogaart, F. Serra-Graells, Francisco Torres Canals, Gabriel Abadal Berini, Nuria Barniol Beumala, Francesc Xavier Perez Murano

Department of Electronic Engineering

Centro Nacional de Microelectrónica CNM-CSIC

Research output: Contribution to journal › Article › Research

8 Citations (Scopus)

Original language	English
Pages (from-to)	1-1
Journal	Tech. dig., Int. Electron Devices Meet.
Volume	1
DOIs	https://doi.org/10.1109/IEDM.2006.346830
Publication status	Published - 1 Jan 2006

Access to Document

10.1109/IEDM.2006.346830

Cite this

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title = "Full water integration of NEMS on CMOS by nanostencil lithography",

author = "J. Arcamone and {Van de Boogaart}, M.A.F. and F. Serra-Graells and {Torres Canals}, Francisco and {Abadal Berini}, Gabriel and {Barniol Beumala}, Nuria and {Perez Murano}, {Francesc Xavier}",

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AU - Arcamone, J.

AU - Van de Boogaart, M.A.F.

AU - Serra-Graells, F.

AU - Torres Canals, Francisco

AU - Abadal Berini, Gabriel

AU - Barniol Beumala, Nuria

AU - Perez Murano, Francesc Xavier

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DO - 10.1109/IEDM.2006.346830

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JO - Technical Digest - International Electron Devices Meeting

JF - Technical Digest - International Electron Devices Meeting

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