Full wafer integration of NEMS on CMOS by nanostencil lithography

Gabriel Abadal Berini; J. Arcamone; M. van den Boogaart; F. Serra-Graells; S. Hansen; J. Brugger; F. Torres; N. Barniol; F. Pérez-Murano

Full wafer integration of NEMS on CMOS by nanostencil lithography

Gabriel Abadal Berini, J. Arcamone, M. van den Boogaart, F. Serra-Graells, S. Hansen, J. Brugger, F. Torres, N. Barniol, F. Pérez-Murano

Department of Electronic Engineering

Research output: Chapter in Book › Chapter › Research

Original language	English
Title of host publication	IEEE International electron devices meeting, 2006. IEDM'06
Place of Publication	San Francisco (US)
Pages	525-528
Number of pages	3
Edition	1
Publication status	Published - 1 Jan 2006

Cite this

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title = "Full wafer integration of NEMS on CMOS by nanostencil lithography",

author = "{Abadal Berini}, Gabriel and J. Arcamone and Boogaart, {M. van den} and F. Serra-Graells and S. Hansen and J. Brugger and F. Torres and N. Barniol and F. P{\'e}rez-Murano",

year = "2006",

month = jan,

day = "1",

language = "English",

isbn = "978-1-4244-0438-4",

pages = "525--528",

booktitle = "IEEE International electron devices meeting, 2006. IEDM'06",

edition = "1",

}

TY - CHAP

T1 - Full wafer integration of NEMS on CMOS by nanostencil lithography

AU - Abadal Berini, Gabriel

AU - Arcamone, J.

AU - Boogaart, M. van den

AU - Serra-Graells, F.

AU - Hansen, S.

AU - Brugger, J.

AU - Torres, F.

AU - Barniol, N.

AU - Pérez-Murano, F.

PY - 2006/1/1

Y1 - 2006/1/1

M3 - Chapter

SN - 978-1-4244-0438-4

SP - 525

EP - 528

BT - IEEE International electron devices meeting, 2006. IEDM'06

CY - San Francisco (US)

ER -