Fabrication of submicrometric magnetic structures by electron-beam lithography

J. I. Martín; Y. Jaccard; A. Hoffmann; J. Nogués; J. M. George; J. L. Vicent; Ivan K. Schuller

doi:10.1063/1.368042

Fabrication of submicrometric magnetic structures by electron-beam lithography

J. I. Martín, Y. Jaccard, A. Hoffmann, J. Nogués, J. M. George, J. L. Vicent, Ivan K. Schuller

Department of Physics

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Abstract

Submicrometric magnetic structures have been fabricated by electron-beam lithography on Si substrates. High-quality patterns have been obtained with typical length scale of the structures in the range of 100 nm. The designed geometrical configurations are suitable for investigation of their physical properties by transport measurements in a controlled way. In particular, long chains of connected magnetic dots are useful to analyze magnetization reversal processes, whereas ordered arrays of isolated dots can be used to study pinning effects in superconducting films. © 1998 American Institute of Physics.

Original language	English
Pages (from-to)	411-415
Journal	Journal of Applied Physics
Volume	84
Issue number	1
DOIs	https://doi.org/10.1063/1.368042
Publication status	Published - 1 Jul 1998

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10.1063/1.368042

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abstract = "Submicrometric magnetic structures have been fabricated by electron-beam lithography on Si substrates. High-quality patterns have been obtained with typical length scale of the structures in the range of 100 nm. The designed geometrical configurations are suitable for investigation of their physical properties by transport measurements in a controlled way. In particular, long chains of connected magnetic dots are useful to analyze magnetization reversal processes, whereas ordered arrays of isolated dots can be used to study pinning effects in superconducting films. {\textcopyright} 1998 American Institute of Physics.",

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AU - Martín, J. I.

AU - Jaccard, Y.

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AU - Nogués, J.

AU - George, J. M.

AU - Vicent, J. L.

AU - Schuller, Ivan K.

PY - 1998/7/1

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N2 - Submicrometric magnetic structures have been fabricated by electron-beam lithography on Si substrates. High-quality patterns have been obtained with typical length scale of the structures in the range of 100 nm. The designed geometrical configurations are suitable for investigation of their physical properties by transport measurements in a controlled way. In particular, long chains of connected magnetic dots are useful to analyze magnetization reversal processes, whereas ordered arrays of isolated dots can be used to study pinning effects in superconducting films. © 1998 American Institute of Physics.

AB - Submicrometric magnetic structures have been fabricated by electron-beam lithography on Si substrates. High-quality patterns have been obtained with typical length scale of the structures in the range of 100 nm. The designed geometrical configurations are suitable for investigation of their physical properties by transport measurements in a controlled way. In particular, long chains of connected magnetic dots are useful to analyze magnetization reversal processes, whereas ordered arrays of isolated dots can be used to study pinning effects in superconducting films. © 1998 American Institute of Physics.

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JO - Journal of Applied Physics

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Fabrication of submicrometric magnetic structures by electron-beam lithography

Abstract

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