Fabrication of nanogaps for MEMS prototyping using focused ion beam as a lithographic tool and reactive ion etching pattern transfer

Maria Villarroya, Nuria Barniol, Cristina Martin, Francesc Pérez-Murano, Jaume Esteve, Lars Bruchhaus, Ralf Jede, Eric Bourhis, Jacques Gierak

Research output: Contribution to journalArticleResearchpeer-review

7 Citations (Scopus)

Abstract

In this paper we present a different approach using a focused ion beam (FIB) as lithographic tool to define nanometric width gaps, which are then transferred to a silicon substrate by reactive ion etching (RIE). This process has been developed to fit the technological requirements for micro- and nano-electromechanicals systems (M-NEMS) applications. © 2007 Elsevier B.V. All rights reserved.
Original languageEnglish
Pages (from-to)1215-1218
JournalMicroelectronic Engineering
Volume84
DOIs
Publication statusPublished - 1 May 2007

Keywords

  • FIB
  • Focused ion beam
  • NEMS
  • Nanogaps
  • Nanolithography

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