Fabrication of highly regular suspended graphene nanoribbons through a one-step electron beam lithography process

Miquel López-Suárez; Francesc Torres; Narcís Mestres; Riccardo Rurali; Gabriel Abadal

doi:10.1016/j.mee.2014.07.022

Fabrication of highly regular suspended graphene nanoribbons through a one-step electron beam lithography process

Miquel López-Suárez, Francesc Torres, Narcís Mestres, Riccardo Rurali, Gabriel Abadal

Research output: Contribution to journal › Article › Research › peer-review

14 Citations (Scopus)

Abstract

© 2014 Elsevier Ltd. All rights reserved. A method to obtain pre-oriented large longitudinal 1-D arrays of identical suspended graphene nanoribbons is presented. Mechanical exfoliation from graphite was done in order to deposit single- and multiple-layered graphene over a Polymethyl-Methacrylate (PMMA) substrate, which is used as a sacrificial material. Electron beam lithography (EBL) is used to define the anchors and the suspended part of the structures. The method allows achieving a high number of graphene suspended nanoribbons with a very regular width and length. The main advantage of the method, from the process point of view, with respect to other standard procedures is that only one EBL step is needed in the whole sequence, so that the overall process is extremely simplified.

Original language	English
Pages (from-to)	81-85
Journal	Microelectronic Engineering
Volume	129
Issue number	C
DOIs	https://doi.org/10.1016/j.mee.2014.07.022
Publication status	Published - 5 Nov 2014

Keywords

EBL
Graphene
Nanofabrication
Nanoribbons
NEMS

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10.1016/j.mee.2014.07.022

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title = "Fabrication of highly regular suspended graphene nanoribbons through a one-step electron beam lithography process",

abstract = "{\textcopyright} 2014 Elsevier Ltd. All rights reserved. A method to obtain pre-oriented large longitudinal 1-D arrays of identical suspended graphene nanoribbons is presented. Mechanical exfoliation from graphite was done in order to deposit single- and multiple-layered graphene over a Polymethyl-Methacrylate (PMMA) substrate, which is used as a sacrificial material. Electron beam lithography (EBL) is used to define the anchors and the suspended part of the structures. The method allows achieving a high number of graphene suspended nanoribbons with a very regular width and length. The main advantage of the method, from the process point of view, with respect to other standard procedures is that only one EBL step is needed in the whole sequence, so that the overall process is extremely simplified.",

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year = "2014",

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T1 - Fabrication of highly regular suspended graphene nanoribbons through a one-step electron beam lithography process

AU - López-Suárez, Miquel

AU - Torres, Francesc

AU - Mestres, Narcís

AU - Rurali, Riccardo

AU - Abadal, Gabriel

PY - 2014/11/5

Y1 - 2014/11/5

N2 - © 2014 Elsevier Ltd. All rights reserved. A method to obtain pre-oriented large longitudinal 1-D arrays of identical suspended graphene nanoribbons is presented. Mechanical exfoliation from graphite was done in order to deposit single- and multiple-layered graphene over a Polymethyl-Methacrylate (PMMA) substrate, which is used as a sacrificial material. Electron beam lithography (EBL) is used to define the anchors and the suspended part of the structures. The method allows achieving a high number of graphene suspended nanoribbons with a very regular width and length. The main advantage of the method, from the process point of view, with respect to other standard procedures is that only one EBL step is needed in the whole sequence, so that the overall process is extremely simplified.

AB - © 2014 Elsevier Ltd. All rights reserved. A method to obtain pre-oriented large longitudinal 1-D arrays of identical suspended graphene nanoribbons is presented. Mechanical exfoliation from graphite was done in order to deposit single- and multiple-layered graphene over a Polymethyl-Methacrylate (PMMA) substrate, which is used as a sacrificial material. Electron beam lithography (EBL) is used to define the anchors and the suspended part of the structures. The method allows achieving a high number of graphene suspended nanoribbons with a very regular width and length. The main advantage of the method, from the process point of view, with respect to other standard procedures is that only one EBL step is needed in the whole sequence, so that the overall process is extremely simplified.

KW - EBL

KW - Graphene

KW - Nanofabrication

KW - Nanoribbons

KW - NEMS

U2 - 10.1016/j.mee.2014.07.022

DO - 10.1016/j.mee.2014.07.022

M3 - Article

SN - 0167-9317

VL - 129

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EP - 85

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - C

ER -

Fabrication of highly regular suspended graphene nanoribbons through a one-step electron beam lithography process

Abstract

Keywords

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